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PVD process converts a solid, metallic compound substrate material, to an ionized gaseous state.
This ionized gaseous state is generally neutral state, called the plasma, in the vacuum chamber.
One of important advantage of the Arc process compared to the sputtering is that produces considerably higher plasma energy density during the process with almost 100% ionization, This allows to high hardness and density with better adhesion.
High performance hybrid Arc coating systems provide state of the art film coating for R&D and full scale productions.
ISYS technology coating process allows you to produce excellent coatings and high quality coatings.
ISYS has a wealth of experience in the plasma coating technology, we will support an
expert assistance with your applications. |
