| Classification |
Type |
Content |
| System |
Full Auto System |
Self diagnosis (vacuum,insulation) & Full auto system |
| HCD Source |
Electron Acceleration type |
Ion etching & excellent adhesion (¡Ã100N) |
| Arc Source |
New Arc Source |
Smooth surface of decreasing Macro particles |
| Pump |
Rotary/ booster pump |
Backup pump of Diffusion pump |
Diffusion or Cryo(Turbo) |
High Vacuum pump/Main process pump |
| Heater & TC |
40KW |
Maximum heater capacity (High temperature) |
| View port |
Slim type |
Wide view (option : CC camera) |
| Shutter |
Arc & Sputter shutter |
Prevent contamination & excellent performance |
| POWER |
Arc,HCD,Bias power |
Stable power supplies |
| One body |
Whole unit |
Prevention dust contamination & Deluxe Design |
| Vacuum Gauge |
Full range,pirani gauge |
Reliable gauge |
| S/W Program |
Ver. 1.1 |
Real time graph & data base (include Analysis program) |
| Hot Cooling system |
30¡É |
Blocking dew condensation & erasing out gas |
| Sputtering system (option) |
High yield target/Power |
Target yield is about 40% in case of Cr |
| HCD Coating system (Option) |
Hybrid Coating(HCD) |
We recommend it for R&D system |
